Most applications of positron beams require knowledge of the implantation characteristics for an appropriate interpretation of the experimental data. In this work, the median implantation depth as a function of implantation energy, z1/2(E), of 3-18 keV positrons and their implantation profile P(z, E) in a total of 13 thin films of atactic polystyrene, poly(styrene-co-acrylonitrile), and polymethylmethacrylate spin coated onto a silicon substrate were determined from positron lifetime measurements using a pulsed, low-energy positron beam. z1/2(E) and P(z; E) were determined from the measurement of the ortho-positronium yield obtained from the intensity I3 of the long lifetime, z1/2(E) was parametrized with the commonly used power-law fit z1/2(E) = (A/ρ)En, with ρ and E in units of g cm-3 and keV, respectively, yielding    «

Most applications of positron beams require knowledge of the implantation characteristics for an appropriate interpretation of the experimental data. In this work, the median implantation depth as a function of implantation energy, z1/2(E), of 3-18 keV positrons and their implantation profile P(z, E) in a total of 13 thin films of atactic polystyrene, poly(styrene-co-acrylonitrile), and polymethylmethacrylate spin coated onto a silicon substrate were determined from positron lifetime measurement...    »