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Authors:
Coleman, Emma; Monaghan, Scott; Gity, Farzan; Schmidt, Michael; Connolly, James; Lin, Jun; Walsh, Lee; Cherkaoui, Karim; O´Neill, Katie; McEvoy, Niall; O´Coileáin, Cormac; Buckley, Darragh; O´Dwyer, Colm; Hurley, PK; Duesberg, Georg 
Document type:
Zeitschriftenartikel / Journal Article 
Title:
Large Area Growth of MoS2 by Chemical Vapour Deposition 
Journal:
ECS Meeting Abstracts 
Volume:
2018 
Issue:
MA2018-02 
Year:
2018 
Language:
Englisch 
Abstract:
Transition Metal Dichalcogenindes (TMD) have considerable potential for applications spanning electronics, sensors and optoelectronics due to the wide ranging electronic and optical properties which are displayed by this class of 2D layered materials [1]. Research is focused on issues such as: large area growth [2, 3], stable approaches to doping [4] and achieving required values of specific contact resistivity [5]. We are contributing to the research effort by investigating the structural, optical and electronic properties of crystalline molybdenum disulfide (MoS2) grown by chemical vapour deposition (CVD) in a commercial 300mm atomic layer deposition reactor. In this work we report on the properties of monolayer and multilayer MoS2 growth at 550 o C using Mo (CO) 6 and H2S precursors on a number of different substrates, including SiO2, sapphire and amorphous alumina. This work focuses on the topology … 
ISSN:
2151-2043 ; 1091-8213 
Department:
Fakultät für Elektrotechnik und Informationstechnik 
Institute:
EIT 2 - Institut für Physik 
Chair:
Düsberg, Georg 
Open Access yes or no?:
Ja / Yes 
Miscellaneous:
Extended Abstract