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Autorinnen/Autoren:
Caffrey, Eoin; Munuera, Jose M.; Gabbett, Cian; Doolan, Luke; Neilson, Joseph; Wells, Rebekah A.; McCrystall, Mark; McNamara, Alexandra; Carey, Tian; Gerlei, Martin; Seifert, Paul; Duesberg, Georg S.; Coleman, Jonathan N.
Dokumenttyp:
Zeitschriftenartikel / Journal Article
Titel:
Quantifying the Influence of Nanosheet Aspect Ratio on Network Morphology and Junction Resistance in Solution-Processed Nanosheet Networks
Zeitschrift:
ACS Nano
Jahr:
2025
Sprache:
Englisch
Stichwörter:
graphene ; aspect ratio ; junction resistance ; nanosheet network morphology ; spray coating
Abstract:
Optimizing solution-processed nanosheet networks for electronic applications requires understanding the relationship between nanosheet dimensions, network morphology, and electrical properties. Here, we fabricate graphene nanosheets with both low- and high-aspect-ratios using liquidphase exfoliation (LPE) and electrochemical exfoliation (EE), respectively. Spray-coated networks of both nanosheet types display distinct morphological and electrical properties. Highresolution 3D imaging sho...     »
ISSN:
1936-0851 ; 1936-086X
DOI:
10.1021/acsnano.5c04008
URL zum Inhalt:
https://doi.org/10.1021/acsnano.5c04008
Fakultät:
Fakultät für Elektrotechnik und Informationstechnik
Institut:
EIT 2 - Institut für Physik
Professorin/Professor:
Düsberg, Georg
Projekt:
2D-PRINTABLE
Open Access:
Ja / Yes
Open-Access-Lizenz:
CC BY 4.0
URL zur Lizenz:
https://creativecommons.org/licenses/by/4.0/
Sonstige Angaben:
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